Multiscale micro-patterned polymeric and carbon substrates derived from buckled photoresist films: Fabrication and cytocompatibility

Kulkarni, M M and Sharma, Chandra Shekhar and Sharma, A and Kalmodia, S and Basu, B (2012) Multiscale micro-patterned polymeric and carbon substrates derived from buckled photoresist films: Fabrication and cytocompatibility. Journal of Materials Science, 47 (8). pp. 3867-3875. ISSN 0022-2461

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We report here a novel and simple buckling-based multiscale patterning of negative photoresist films which were subsequently pyrolyzed to yield complex micro-patterned carbon surfaces. Unlike other polymers, the use of a photoresist layer allows the overall pattern definition by photolithography on which the geometry and length scale of the buckling-instability are superimposed. The photoresist film swells anisotropically during developing and buckles after subsequent drying due to the difference in the shrinkage of the hard cross-linked layer on top of a softer native pre-polymer. We studied the conditions for the formation of a wide variety of complex, fractal buckling patterns as well as directionally aligned zigzag patterns over a large area. For example, the buckling diminished for the films below a critical thickness and after a prolonged UV exposure, both of which eliminate the softer under-layer. These patterned carbon substrates are also shown to be biocompatible for the cellular adhesion and viability by using L929 mouse fibroblast cells, thus indicating their potential use in bio-MEMS platforms with a conductive substrate. The buckled carbon patterns were found to be a better choice of a substrate for cell growth and viability as compared to flat and simply periodic patterned carbon surfaces

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IITH Creators:
IITH CreatorsORCiD
Sharma, Chandra ShekharUNSPECIFIED
Item Type: Article
Uncontrolled Keywords: BioMEMS; Buckling patterns; Carbon substrates; Carbon surface; Cellular adhesion; Conductive substrates; Critical thickness; Cytocompatibility; Length scale; Micropatterned; Mouse-fibroblasts; Multiscales; Negative photoresists; Pattern definition; Photoresist film; Photoresist layers; UV exposure
Subjects: Chemical Engineering > Biochemical Engineering
Divisions: Department of Chemical Engineering
Depositing User: Team Library
Date Deposited: 14 Nov 2014 07:05
Last Modified: 22 Jan 2019 05:35
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