Fabrication of Resorcinol-Formaldehyde Xerogel based High Aspect Ratio 3-D Hierarchical C-MEMS Structures

Sharma, Chandra Shekhar and Katepalli, H and Sharma, A and Teixidor, G T and Madou, M J (2014) Fabrication of Resorcinol-Formaldehyde Xerogel based High Aspect Ratio 3-D Hierarchical C-MEMS Structures. ECS Transactions, 61 (7). pp. 45-54. ISSN 1938-5862

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We demonstrate a novel method to fabricate arrays of resorcinol- formaldehyde xerogel (RFX) based high aspect ratio (HAR) three- dimensional (3-D) hierarchical C-MEMS structures. Starting from a master pattern of HAR 3-D posts fabricated in SU-8 negative photoresist by photolithography, a negative PDMS stamp with arrays of holes was prepared by micromolding. The PDMS stamp was then used to fabricate HAR 3-D RFX posts by replica molding. The 3-D RFX posts thus fabricated were electrosprayed with SU-8 or an RF sol in the form of submicron or nano sized droplets and followed by pyrolysis to yield HAR 3-D hierarchical carbon posts. To characterize their use in C-MEMS based batteries, galvanostatic (charge and discharge) experiments on RFX derived carbon showed that it can be reversibly intercalated with Li ions and possesses superior intercalation properties as compared to SU- 8 derived carbon which is a widely used material in C-MEMS.

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IITH Creators:
IITH CreatorsORCiD
Sharma, Chandra ShekharUNSPECIFIED
Item Type: Article
Additional Information: Helpful discussions with Dr. Manish Kulkarni are greatly acknowledged.
Subjects: Chemical Engineering > Biochemical Engineering
Divisions: Department of Chemical Engineering
Depositing User: Team Library
Date Deposited: 17 Mar 2015 09:13
Last Modified: 22 Jan 2019 05:33
URI: http://raiith.iith.ac.in/id/eprint/1404
Publisher URL: http://dx.doi.org/10.1149/06107.0045ecst
OA policy: http://www.sherpa.ac.uk/romeo/issn/1938-5862/
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