Fabrication of Si Membrane using Frontend Bulk Micromachining

Paul, Nirupam and Singh, Shiv Govind and Vanjari, Siva Rama Krishna et. al. (2017) Fabrication of Si Membrane using Frontend Bulk Micromachining. In: XIX International Workshop on Physics of Semiconductor Devices, IWPSD, New Delhi, India.

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Abstract

This paper reports the fabrication of Silicon membrane in a simple and cost effective manner by frontend bulk micromachining process, which is one of the proven techniques of making suspended microstructures. In the proposed mask design, to be used as pixel for Microbolometer application, all the rectangular openings are aligned at 45⁰ with respect to the wafer primary flat (100) Silicon wafer, such that only <100> planes are exposed and etched during anisotropic etching. The proposed fabrication techniques are very simple and cost-effective, as it used only a single mask for realizing the membrane structure. All process steps were initially simulated using Intellisuite FABSIM based physical simulator and later entire individual process steps are experimentally verified. Both simulation and experimental result shows very good agreement on all process steps.

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IITH Creators:
IITH CreatorsORCiD
Singh, Shiv Govindhttp://orcid.org/0000-0001-7319-879X
Vanjari, Siva Rama KrishnaUNSPECIFIED
Item Type: Conference or Workshop Item (Paper)
Subjects: Electrical Engineering
Divisions: Department of Electrical Engineering
Depositing User: Team Library
Date Deposited: 15 May 2019 09:42
Last Modified: 15 May 2019 09:42
URI: http://raiith.iith.ac.in/id/eprint/4973
Publisher URL:
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