A measurement free pre-etched pattern to identify the <110> directions on Si{110} wafer

Singh, S S and Avvaru, V N and Veerla, S and Pandey, A K and Pal, P (2017) A measurement free pre-etched pattern to identify the <110> directions on Si{110} wafer. Microsystem Technologies, 23 (6). pp. 2131-2137. ISSN 0946-7076

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Abstract

In this paper, we present a self-aligning pre-etched pattern based technique to precisely determine the <110> direction on Si{110} wafer surface. These patterns after etching, reveals the crystallographic direction by self-aligning itself in a straight line at the <110> direction while getting self-misaligned at other directions. As a result, the exact direction can be identified by a simple visual inspection under a microscope without the need of measurement of any kind. To test the accuracy of the proposed method, we fabricated two 32 mm long channels, one oriented along the <110> direction and other along the <112> directions using the <110> direction obtained from the proposed method as the reference. The undercutting is measured at different locations on the two channels and is found to vary within a submicron range in each case. Such uniform undercutting implies that the presented technique to determine the <110> direction is accurate. This methodology is simple and can be used conveniently to fabricate MEMS structures with high dimensional accuracy.

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IITH Creators:
IITH CreatorsORCiD
Pandey, A KUNSPECIFIED
Pal, PUNSPECIFIED
Item Type: Article
Uncontrolled Keywords: CRYSTAL ORIENTATION; SILICON-WAFERS; CRYSTALLOGRAPHIC ORIENTATION; ALKALINE-SOLUTIONS; TMAH; ALIGNMENT; KOH; FABRICATION; SURFACE; PLANES
Subjects: Others > Nanotechnology
Electrical Engineering > Electrical and Electronic
Physics > Astronomy Astrophysics
Divisions: Department of Physics
Depositing User: Team Library
Date Deposited: 26 May 2016 04:48
Last Modified: 14 Aug 2017 06:46
URI: http://raiith.iith.ac.in/id/eprint/2412
Publisher URL: https://doi.org/10.1007/s00542-016-2984-2
OA policy: http://www.sherpa.ac.uk/romeo/issn/0946-7076/
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